Park Systems Launches 2026 NANOscientific Symposium Series in Korea

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GWACHEON, South Korea, Sept. 10, 2026 /CourierPR/ -- Park Systems Corp., a leading provider of atomic force microscopy (AFM) and nanometrology solutions, kicked off the 2026 NANOscientific Symposium (NSS) series with the inaugural NSS Korea on August 20-21 at the company’s new headquarters in Gwacheon, South Korea. The event brought together nearly 200 researchers and industry professionals, marking an expansion of the NANOscientific community beyond traditional atomic force microscopy.
This year’s NSS Korea reflected the growing scope of nanoscale research and measurement, with a particular emphasis on the convergence of artificial intelligence (AI) with nanoscale metrology. Dr. Byung-Ho Lee, Executive Vice President at Park Systems and former Fellow at SK hynix, delivered the keynote address, highlighting the industry shift towards more complex three-dimensional device architectures, where AI and deep learning are becoming essential tools for metrology and inspection.
The symposium featured a keynote presentation from Prof. Yunseok Kim of Sungkyunkwan University, who showcased an AI-driven AFM workflow using the Park FX40. This workflow utilized machine learning-based segmentation and sparse sampling to reconstruct high-quality piezoresponse force microscopy images, demonstrating the potential to accelerate nanoscale characterization while preserving quantitative information.
Another major focus of the morning session was nanoscale infrared characterization using photo-induced force microscopy (PiFM). Prof. Hyo Jung Kim of Pusan National University presented a cross-sectional PiFM study, using the Park FX200 IR to map crystal alignment in perovskite solar cell absorber layers. This work, published earlier this year in Advanced Energy Materials, exemplified the expanding nano-IR lineup, including the newly launched FX40 IR.
The event also featured presentations and demonstrations on semiconductor manufacturing and advanced packaging, with contributions from Samsung Electronics and SK hynix. These talks addressed emerging requirements for surface topography, overlay, and defect inspection in high-bandwidth memory (HBM), 3D integrated circuits, and panel-level packaging. Park Systems’ own presentation highlighted the company’s growing Industrial AFM portfolio for advanced packaging applications.
The second day of the symposium included hands-on demonstrations across Research AFM, Industrial AFM, nano-IR, and optical measurement technologies. These demonstrations covered a wide range of applications, from atomic-scale lattice imaging and electrical characterization to nanoscale infrared analysis, automated wafer metrology, and optical surface measurement.
Park Systems General Manager of Domestic Business Unit, YG Lee, commented, "NSS Korea has grown alongside the researchers who attend it. Expanding this year's program beyond AFM reflects where the science is actually heading, and where our customers are asking us to go with them."
The 2026 NANOscientific Symposium Series will continue at Charles University in Prague, Czech Republic (September 9-11), Northeastern University in Boston, USA (September 29-30), the University of Malaya in Kuala Lumpur, Malaysia (October 14), and the University of Tokyo in Japan (October 29). Through these global symposiums, Park Systems and the NANOscientific community aim to bring together researchers, institutions, and technology leaders across disciplines to exchange ideas and address emerging challenges in nanoscale measurement.