Semicera Launches 59,000 Square Meter Manufacturing Campus

CALIFORNIA, CA, UNITED STATES, October 22, 2026 /CourierPR/ -- Semicera, the brand of Ningbo Miami Advanced Material Technology Co., Ltd., has unveiled a significant expansion with the launch of a 59,000 square meter (about 88 mu) manufacturing campus in Ningbo, Zhejiang. Founded in 2015, the company has consolidated its production capabilities in this new facility, which integrates raw material purification, substrate forming, chemical vapor deposition (CVD) coating deposition, precision machining, and inspection processes under one roof.

The new campus, launched in 2025, marks a substantial step in Semicera’s strategic growth. The facility houses high-temperature CVD furnaces, vacuum purification furnaces, and horizontal graphitization furnaces, along with in-house inspection equipment such as a four-point probe and a coefficient of thermal expansion (CTE) tester. This setup enables Semicera to measure coating thickness, coating adhesion, purity, and thermal expansion on-site, enhancing the repeatability and consistency of its products.

Semicera operates dual research centers and three production bases, with more than 50 production lines and approximately 600 employees. Over 25 percent of its workforce is dedicated to research and development, underscoring the company’s commitment to innovation. The company’s product portfolio includes CVD SiC coating parts, CVD TaC coating parts, CVD PyC coating parts, SiC ceramic parts, semiconductor graphite components, quartz components, carbon fiber parts, and CFC material, among others.

Semicera’s CVD SiC coating graphite carrier (CVD-01) is designed for semiconductor epitaxy and rapid thermal processing (RTP) applications. It features a coating thickness typically ranging from 50 to 150 micrometers, with a purity of 99.99995 percent (6N grade, total ash ≤5 ppm) and a coating hardness of 2500 Vickers (40 GPa). The coating has an FCC beta-phase polycrystalline structure with (111) orientation.

The CVD TaC coating graphite carrier (CVD-02) is optimized for compound semiconductor epitaxy, including GaN and SiC processes. It offers a coating thickness of 25 to 45 micrometers, with a maximum operating temperature of up to 2,200 °C and resistance to ammonia (NH₃) and hydrogen (H₂) etching. The cubic tantalum carbide matrix is intended to extend the life of graphite parts and reduce the risk of metal contamination.

Semicera also offers PyC coating, which is applied to high-purity graphite parts to suppress gas permeation and particle shedding during high-temperature heat treatment. Recrystallized silicon carbide (RCSiC) is used for high-temperature components requiring purity and thermal shock stability, such as SiC wafer boats rated to 1,600 °C with zero structural deformation and a service life more than five times that of conventional quartz boats.

The company’s SiC furnace tubes, SiC paddles, quartz wafer boats, and quartz furnace tubes are designed to meet the stringent requirements of semiconductor manufacturing processes. Isostatic graphite, CFC material, and rigid felt are also part of Semicera’s supporting materials.

Semicera applies Lean 6-Sigma quality control across its production flow, aiming for repeatable coating thickness, porosity, and purity between batches. The company reports 100 percent testing before shipment, with a focus on epitaxy processes where the surface state of a carrier directly affects layer uniformity.

The new facility supports Semicera’s mission to shape the future with materials and build core technology in critical semiconductor materials. The company maintains collaboration with universities and research institutions and fields a research organization of doctoral and master’s-level engineers. More than 100 engineers are engaged in R&D, contributing to the company’s long-cycle process material partnership.

Semicera’s customer programs across North America, Japan, South Korea, Germany, and Taiwan demonstrate the company’s commitment to quality and reliability. For example, in North America, the company supplied 900 units per month for epitaxy processes, achieving stable epitaxial uniformity and reducing equipment maintenance downtime by 15 percent over two years. In Japan, the company supplied 200 units per month for epitaxy processes, achieving ultra-low particle counts and a reported 2.5 percent improvement in wafer yield over two years.

With exports accounting for roughly 40 percent of sales, Semicera’s new facility will further strengthen its global presence. The company offers OEM service with customization of voltage and logo, a minimum order quantity of one unit, and a typical production lead time of 30 to 50 days against a monthly capacity of more than 10,000 units. Delivery terms include EXW, FCA, DAP, and DDP, with pre-shipment testing as the acceptance criterion.